Ambient-Pressure Plasma Technology
that Proposes New Solutions in FPD Manufacturing Processes
Sekisui Chemical Ambient-Pressure Plasma
The ambient-pressure process doesn’t require a vacuum, which allows for continual treatment and incorporation into the production line
Generates plasma without needing to select the gas type
Handles a range of substrates with three types of plasma generation methods
The remote-method of plasma generation allows for treatment without electrical damage to the substrate
Principles of Ambient-Pressure Plasma Generation
Our original plasma generation technology can generate uniform glow discharge plasma under ambient-pressure conditions.
General Ambient-Pressure Discharge
Sekisui Chemical Ambient-Pressure Plasma
Plasma treatment methods
| Direct | Remote | Spot | |
|---|---|---|---|
| Image of treatment |  |
 |
 |
| Plasma irradiation mechanism | Substrate is directly inserted between the electrodes (plasma space) and irradiated | Plasma spurts out from the slit and is irradiated |
Localized irradiation of plasma |
| Features | Handles high-speed treatment | No electrical damage | Localized treatment using ultra-high density plasma |
Direct
Image of treatment
Plasma irradiation mechanism
Substrate is directly inserted between the electrodes (plasma space) and irradiated
Features
Handles high-speed treatment
Remote
Image of treatment
Plasma irradiation mechanism
Plasma spurts out from the slit and is irradiated
Features
No electrical damage
Spot
Image of treatment
Plasma irradiation mechanism
Localized irradiation of plasma
Features
Localized treatment using ultra-high density plasma
