The ambient-pressure process doesn’t require a vacuum, which allows for continual treatment and incorporation into the production line
Generates plasma without needing to select the gas type
Handles a range of substrates with three types of plasma generation methods
The remote-method of plasma generation allows for treatment without electrical damage to the substrate
Our original plasma generation technology can generate uniform glow discharge plasma under ambient-pressure conditions.
Direct | Remote | Spot | |
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Image of treatment | ![]() |
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Plasma irradiation mechanism | Substrate is directly inserted between the electrodes (plasma space) and irradiated | Plasma spurts out from the slit and is irradiated |
Localized irradiation of plasma |
Features | Handles high-speed treatment | No electrical damage | Localized treatment using ultra-high density plasma |
Substrate is directly inserted between the electrodes (plasma space) and irradiated
Handles high-speed treatment
Plasma spurts out from the slit and is irradiated
No electrical damage
Localized irradiation of plasma
Localized treatment using ultra-high density plasma